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KMID : 1011420090140010063
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Journal of Korean Ophthalmic Optics Society
2009 Volume.14 No. 1 p.63 ~ p.68
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Effect of Oxygen Incorporation in the Fabrication of TiN Thin Film for Frame by UBM Sputtering System
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Park Moon-Chan
Lee Jong-Geun
Joo Kyung-Bok
Lee Wha-Ja
Kim Eung-Soon
Choi Kwang-Ho
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Abstract
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Purpose: TiN films were deposited on sus304 by unbalanced magnetron sputtering system which was designed and developed as unbalancing the strength of the magnets in the magnetron electrode. The effect of oxygen incorporation in the fabrication of deposited films was investigated.
Methods: The cross sections of deposited films on Silicon wafer were observed by SEM to measure the thickness of the films, the components of the surface of the films were identified by XPS survey spectra, the compositional depth-profile of deposited films was examined by an XPS apparatus.
Results: From the data of XPS depth profile of films, it could be seen that the element O as well as the elements Ti and N present in the surface of the film and the relative percentage of the element O was constant at 65 at.% with respect to the depth of film.
Conclusions: The color change with thickness of the films had something to do with the change of Ti 2p3/2 peak intensity and shape mixed of TiO2, TiN, TiOxNy compound.
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KEYWORD
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UBM sputter, TiN coating, XPS, depth profiling
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